UV Fused Silica Long Pass Optical Filter

This long pass optical filter is manufactured from UV fused silica and designed to deliver high transmission above the cutoff wavelength while effectively blocking shorter wavelengths, making it ideal for precision optical and imaging systems.

  • Material :

    UV Fused Silica
  • Dimension Tolerance :

    +0.0 / -0.1 mm
  • Thickness Tolerance :

    2 mm ± 0.2 mm
  • Blocking Level :

    OD ≥ 2
  • Wavefront Error :

    λ/4 @ 633 nm
  • Central Wavelength Tolerance :

    ±1%
  • Parallelism :

    < 30 arc seconds
  • Surface Quality :

    40/20 – 60/40
  • Product Details

 

Product Description

The UV fused silica long pass filter selectively transmits wavelengths longer than a specified cutoff while suppressing shorter wavelengths through multilayer interference coating technology. With excellent optical uniformity and stable spectral performance, this long pass filter is suitable for demanding optical environments.

 

Performance Advantages

High average transmission (Tavg > 90%) above the cutoff wavelength

Sharp cutoff edge for improved spectral separation

UV fused silica substrate ensures low absorption and thermal stability

Low wavefront distortion suitable for imaging and laser applications

Durable coating with consistent optical performance at normal incidence

 

Application Range

This long pass optical filter is widely used in fluorescence analysis, infrared imaging systems, laser equipment, biomedical diagnostics, and environmental monitoring instruments where reliable wavelength separation is required.

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